Elemental Analyzer

Elemental analysis by X-ray fluorescence (XRF) and glow discharge optical emission spectroscopy (GD-OES) enables rapid, non-destructive multi-element characterization of solid materials — from bulk composition to thin-film depth profiling. XRF identifies and quantifies elements by detecting characteristic fluorescence radiation, while GD techniques use plasma etching to reveal elemental composition as a function of depth with nanometer resolution. NewRoad provides XRF and GD elemental analysis instruments for materials science, quality control, and surface coating analysis.

How it works

FROM PRINCIPLE TO APPLICATION

In XRF, a primary X-ray beam irradiates the sample, ejecting inner-shell electrons from atoms. As outer-shell electrons fill the vacancies, they emit characteristic X-rays at element-specific energies detected by energy-dispersive or wavelength-dispersive detectors. In GD analysis, the sample serves as a cathode in a low-pressure argon plasma; ion bombardment sputters material layer by layer, and ablated atoms are analyzed by optical emission spectroscopy to produce quantitative depth profiles with nm-level depth resolution and ppm-level detection limits.

What It Is Used For

Alloy and metal composition verification

Coating thickness and composition measurement

Thin film elemental depth profiling

Incoming material quality control

Trace element and contaminant detection

Semiconductor and electronic layer analysis

Corrosion product characterization

Regulatory compliance testing (RoHS, WEEE)

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