PRODUCTS

MK52

The MinusK MK52 is a medium-to-large negative-stiffness vibration isolation table providing 0.5 Hz passive isolation for precision instruments requiring a larger, more rigid working surface.

overview

about this product

The MinusK MK52 is a mid-to-large format vibration isolation table from MinusK Technology, incorporating the patented negative-stiffness mechanism to deliver 0.5 Hz natural frequency vibration isolation in a larger table format suitable for bigger instruments and multi-component experimental setups. The MK52 provides a generous platform area for instruments that require more space than compact isolators can offer – large optical microscopes, AFM systems with associated electronics, or experimental setups combining multiple components. The negative-stiffness technology provides significantly better low-frequency isolation than comparable-size pneumatic air tables while eliminating the need for compressed air infrastructure. The MK52 delivers vibration transmissibility below 1% at frequencies above 1-2 Hz, making it effective against the most common sources of laboratory vibration including HVAC, foot traffic, and building structural resonances. NewRoad provides the MinusK MK52 in Israel for nanotechnology, optical, and life science research laboratories.

WHY CHOOSE THIS PRODUCT

Larger platform format for big instruments and multi-component setups 0.5 Hz natural frequency – significantly below pneumatic air table performance Outperforms air tables at frequencies of primary building vibration concern Passive operation with no compressed air or electricity infrastructure needed Robust, stable construction for demanding research environments

Specifications & Performance

Natural frequency

0.5 Hz (vertical and horizontal)

Isolation type

Passive negative-stiffness

Format

Medium-to-large isolation table

Utilities required

None

Compatible Add-Ons

No data was found

ADDITIONAL INFORMATION

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Materials Science

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Nanotechnology

Semiconductors

High-sensitivity surface and thin-film characterization instruments are essential for semiconductor wafer processing, yield optimization, and failure analysis at the nanoscale.

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