The HORIBA UVISEL Plus is a spectroscopic ellipsometer covering the UV-VIS-NIR range (190–2100 nm), designed for precision optical characterization of thin films, multilayer stacks, and complex optical materials, delivering complete dielectric function measurement from a single instrument.
The HORIBA UVISEL Plus is a phase-modulation spectroscopic ellipsometer (PMSE) covering the spectral range from 190 nm (deep UV) to 2100 nm (near-IR) in a single instrument, enabling complete optical characterization of thin films, multilayer stacks, and bulk materials across the widest possible wavelength range without changing hardware. Ellipsometry measures the change in polarization state of light upon reflection from a sample surface; from these measurements, the complex dielectric function (refractive index n and extinction coefficient k as functions of wavelength) and layer thicknesses can be extracted by fitting optical models to the measured data. The phase-modulation technique used in the UVISEL Plus provides superior signal-to-noise ratio and immunity to intensity fluctuations compared to rotating-element designs, and allows accurate measurement of the full Mueller matrix for complete characterization of anisotropic and depolarizing samples. With UV coverage starting at 190 nm, the UVISEL Plus is particularly valuable for characterizing wide-bandgap materials, UV optical coatings, and thin dielectric films at short wavelengths where optical contrast is high. Near-IR coverage to 2100 nm allows measurement of semiconductor bandgaps, free-carrier absorption, and infrared-transparent coatings. The instrument includes a high-numerical-aperture focusing option for small-spot measurements on patterned samples, wafers, and microstructures. DeltaPsi2 software provides comprehensive optical modeling and data fitting libraries covering hundreds of materials. NewRoad provides the HORIBA UVISEL Plus in Israel for semiconductor, solar cell, optical coating, and advanced materials research and manufacturing.
Phase-modulation spectroscopic ellipsometry (PMSE)
190–2100 nm (UV-VIS-NIR)
Psi, Delta, Mueller matrix, n, k, thickness
High-NA focusing for small-spot measurements on patterned samples
Semiconductors, solar cells, optical coatings, dielectrics, complex materials
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